Satoshi Maemori

Title: Satoshi Maemori: Innovator in Resist Technology

Introduction

Satoshi Maemori is a prominent inventor based in Sagamihara, Japan. He has made significant contributions to the field of resist technology, holding a total of nine patents. His work primarily focuses on developing advanced materials and methods for lithography processes.

Latest Patents

One of Maemori's latest patents is a resist composition and method of forming a resist pattern. This resist composition includes a base component that exhibits changed solubility in a developing solution under the action of acid. It is designed for use in lithography processes that employ light with a wavelength of 193 nm or less as the exposure light source. The composition also features an acid generator component that generates acid upon exposure and a polymeric compound with specific structural units. Another notable patent is for a resist surface modifying liquid, which serves as a surface treatment for resist films prior to the post-exposure baking step. This liquid helps inhibit defects in the resist film by reducing water repellency.

Career Highlights

Satoshi Maemori is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company known for its innovations in the semiconductor industry. His work has been instrumental in advancing the capabilities of resist materials used in photolithography.

Collaborations

Throughout his career, Maemori has collaborated with notable colleagues, including Kazuyuki Nitta and Taku Nakao. These collaborations have further enhanced the development of innovative solutions in resist technology.

Conclusion

Satoshi Maemori's contributions to resist technology and his innovative patents have significantly impacted the field of lithography. His work continues to influence advancements in semiconductor manufacturing processes.