This inventor holds 3 USPTO granted patents. Top assignee: Tosoh Corporation. Active years: 1994-2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Ebina, JP (1994 - 1995)
- Atsugi, JP (2001)
Company Filing History:
Years Active: 1994-2001
Title: Satoshi Kurosawa: Innovator in Sputtering Technology
Introduction
Satoshi Kurosawa is a notable inventor based in Ebina, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets and magnetic recording media. With a total of 3 patents to his name, Kurosawa continues to push the boundaries of innovation in his industry.
Latest Patents
Kurosawa's latest patents include a method for creating a high-density sputtering target. This process involves a mixture of zinc sulfide and silicon dioxide as starting material powder, combined with zinc oxide in an amount ranging from 0.5 to 5 wt %. The mixture is subjected to hot pressing sintering, resulting in a sintered body that can be produced at a high yield. Another significant patent involves a magnetic recording medium that features a magnetic film layer coated with a lubricant of exceptional purity. This lubricant ensures that no impurities and low molecular weight species are substantially detected by gel permeation chromatography.
Career Highlights
Kurosawa is currently employed at Tosoh Corporation, where he applies his expertise in materials science to develop innovative solutions. His work has been instrumental in advancing the technology used in sputtering and magnetic recording applications.
Collaborations
Throughout his career, Kurosawa has collaborated with esteemed colleagues such as Yukio Ohnuki and Akio Kondo. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Satoshi Kurosawa is a prominent figure in the field of sputtering technology, with a focus on creating high-quality materials for various applications. His contributions through patents and collaborations highlight his commitment to innovation and excellence in his work.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
