Location History:
- Oshu, JP (2016 - 2020)
- Iwate, JP (2020)
Company Filing History:
Years Active: 2016-2020
Title: Satoru Koike: Innovator in Substrate Processing Technology
Introduction
Satoru Koike is a prominent inventor based in Oshu, Japan, known for his contributions to substrate processing technology. With a total of 4 patents to his name, he has made significant advancements in the field, particularly through his work at Tokyo Electron Limited.
Latest Patents
One of his latest patents is a substrate processing apparatus designed to enhance the efficiency of substrate handling. This apparatus features a substrate holder that vertically loads multiple substrates in stages, separated by partition plates. It includes a process chamber that houses the substrate holder and incorporates protrusions that create clearances for inert gas supply, forming positive-pressure sections. Another notable patent is a mixed gas multiple line supply system, which includes a flow splitter that adjusts the flow rates of mixed gas across various supply lines. This system is crucial for optimizing gas distribution in processing containers.
Career Highlights
Throughout his career, Satoru Koike has demonstrated a commitment to innovation in substrate processing. His work has not only contributed to the technological advancements at Tokyo Electron Limited but has also set new standards in the industry.
Collaborations
Satoru has collaborated with notable colleagues, including Hiromi Nitadori and Shinobu Kawamorita, to further enhance the development of substrate processing technologies.
Conclusion
Satoru Koike's innovative work in substrate processing technology has made a lasting impact on the industry. His patents reflect a deep understanding of the complexities involved in substrate handling and gas supply systems.