Sascha Kraus

Title: Sascha Kraus: Optical Mounting Systems for Semiconductor Lithography.

Introduction

Sascha Kraus is an inventor based in Aalen, Germany. His patent work includes mounting apparatuses designed to position optical elements, including lenses used in projection systems for semiconductor lithography. He is associated with Carl Zeiss Stiftung and Carl Zeiss SMT AG. Kraus is named on 4 patents.

Latest Patents

Two of Kraus’s latest patents concern mounting apparatuses that connect an inner mount holding an optical element to an outer mount.

One patent describes three circumferentially distributed articulations connecting the mounts. Manipulators act on these articulations to displace the inner mount, while a mechanism in each articulation transforms radial movement into axial movement.

The other patent describes three circumferentially distributed solid-state articulations. Each articulation has a T-shaped cross section, with attachment points near the outer ends of the T-bar and manipulators acting on the T-support. This arrangement enables controlled displacement of the inner mount.

Career Highlights

Kraus’s listed company affiliations are Carl Zeiss Stiftung and Carl Zeiss SMT AG. His patent contributions focus on mounting and adjustment mechanisms for precision optical systems, particularly those used in semiconductor lithography.

Collaborations

Jochen Becker and Harry Bauer are identified as Kraus’s coworkers.

Conclusion

Sascha Kraus’s patents address precise optical-element mounting, with mechanisms intended to support controlled positioning in semiconductor lithography systems.