This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Innovations by Inventor Sarah Bowen
Introduction
Sarah Bowen is an accomplished inventor based in Beaverton, Oregon. He has made significant contributions to the field of materials science, particularly in the area of carbon-doped oxide films. His innovative approach has led to advancements that enhance the functionality of these materials.
Latest Patents
One of Sarah Bowen's notable patents is titled "Enhanced surface modification of low K carbon-doped oxide." This invention discloses a method for modifying the hydrophobicity of the surface of a carbon-doped oxide film. Carbon-doped oxide films are known for their high hydrophobic nature, which can inhibit effective cleaning by conventional techniques. The present invention utilizes a surface treatment comprising a solution of sulfuric acid and hydrogen peroxide in water to alter the hydrophobicity of the carbon-doped oxide. After treatment, the surface of the carbon-doped oxide becomes hydrophilic, while retaining its low k dielectric characteristics.
Career Highlights
Sarah Bowen is currently employed at Intel Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of carbon-doped oxide materials, making them more effective for various applications.
Collaborations
Sarah has collaborated with notable colleagues, including Ebrahim Andideh and Lawrence D Wong. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
In summary, Sarah Bowen is a prominent inventor whose work on carbon-doped oxide films has led to significant advancements in material science. His innovative patent demonstrates a practical solution to enhancing the properties of these materials, showcasing his expertise and commitment to innovation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
