This inventor holds 1 USPTO granted patent. Top assignee: Kla Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations by Santosh Kumar Sankar
Introduction
Santosh Kumar Sankar is a notable inventor based in San Jose, CA. He has made significant contributions to the field of vacuum technology. His innovative approach has led to the development of a unique patent that addresses contamination measurement in vacuum chambers.
Latest Patents
Santosh Kumar Sankar holds a patent titled "Method to perform in-situ vacuum contamination measurement and identification in arbitrarily large chambers." This system includes a primary vacuum chamber and a secondary vacuum chamber connected via a gate valve. The gate valve operates between an open position, allowing fluid communication between the chambers, and a closed position, sealing the secondary chamber. A heat exchanger cools the secondary chamber to adsorb contaminants when the gate valve is open. Additionally, a gas source injects a carrier gas into the secondary chamber when the gate valve is closed, and the heat exchanger heats the carrier gas to desorb contaminants into a gas sample. A sample container collects this gas sample from the secondary vacuum chamber. Santosh has 1 patent to his name.
Career Highlights
Santosh Kumar Sankar is currently employed at Kla Corporation, where he continues to innovate in the field of vacuum technology. His work has been instrumental in advancing methods for contamination measurement, which is crucial for various industrial applications.
Collaborations
Santosh collaborates with Makfir Sefa, contributing to the development of advanced technologies in their field.
Conclusion
Santosh Kumar Sankar's innovative work in vacuum technology exemplifies the impact of dedicated inventors in advancing industrial processes. His contributions are paving the way for more efficient contamination measurement techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
