San Diego, CA, United States of America

Santiago Reyero

This inventor holds 4 USPTO granted patents and 2 EPO patents. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2007-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Santiago Reyero. Retrieved from https://idiyas.com/inventor/santiago-reyero

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0

 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2007-2022

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4 patents (USPTO):Explore Patents

Title: Santiago Reyero: Innovations in Projection Calibration and Multi-Pass Printing

Introduction

Santiago Reyero is an inventor based in San Diego, California, whose work includes image calibration and printing technologies. He is associated with Hewlett-Packard Development Company, L.P. His portfolio includes 4 patents.

Latest Patents

One of Reyero’s latest patents, “Perspective Transformation of Images via Touch Signals,” describes a calibration device that projects an image onto a touch screen. A processor transforms the image for projection, receives touch signals identifying corner coordinates, and uses those coordinates to adjust the image’s perspective and size.

Another patent, “Method for Preparing a Print Mask,” concerns preparing masks for multi-pass printing. The method accounts for satellite-drop spray patterns and interactions between main and satellite drops when assigning pass numbers to positions in the mask.

Career Highlights

Reyero’s patent work addresses practical challenges in display calibration and print production. These inventions describe ways to use touch input to refine projected images and to account for ink-drop behavior when preparing print masks.

Collaborations

Reyero’s listed coworkers include Joan Manuel Garcia and Yu-Hsuan Lin. His work is associated with Hewlett-Packard Development Company, L.P.

Conclusion

Santiago Reyero’s inventions reflect a focus on improving image alignment and multi-pass printing through calibration and print-mask techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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