The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2008

Filed:

Oct. 27, 2005
Applicants:

Alejandro Manuel DE Pena, Sant Cugat Del Valles, ES;

Joan Manuel Garcia, Sant Cugat, ES;

Santiago Garcia Reyero, San Diego, CA (US);

Andreu Gonzalez, Barcelona, ES;

Andrew Mackenzie, Barcelona, ES;

Inventors:

Alejandro Manuel De Pena, Sant Cugat Del Valles, ES;

Joan Manuel Garcia, Sant Cugat, ES;

Santiago Garcia Reyero, San Diego, CA (US);

Andreu Gonzalez, Barcelona, ES;

Andrew MacKenzie, Barcelona, ES;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/205 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for preparing a mask for multi-pass printing, comprises determining a characteristic satellite drop spray pattern for printing in a multi-pass mode with a printhead. Positions in the mask are filled with pass numbers. The pass numbers in a given position are selected based on considerations of interactions among main drops and satellite drops.


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