Santa Clara, CA, United States of America

Sanni Sinikka Seppälä

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sanni Sinikka Seppälä. Retrieved from https://idiyas.com/inventor/sanni-sinikka-seppälä

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Sanni Sinikka Seppälä: Innovator in Coating Technologies

Introduction

Sanni Sinikka Seppälä is a notable inventor based in Santa Clara, CA. She has made significant contributions to the field of coating technologies, particularly in enhancing chamber performance through innovative methods.

Latest Patents

Sanni holds a patent for a fluoride coating designed to improve chamber performance. This patent involves protective coatings that include at least one metal fluoride, with formulas selected from M1F, M1M2F, and M1M2M3F, where at least one of M1, M2, or M3 is magnesium or lanthanum. The protective coating can be deposited using various methods, including atomic layer deposition, chemical vapor deposition, electron beam ion assisted deposition, or physical vapor deposition. She has 1 patent to her name.

Career Highlights

Sanni is currently employed at Applied Materials, Inc., where she continues to develop innovative solutions in her field. Her work focuses on improving the performance and reliability of chamber components through advanced coating techniques.

Collaborations

Sanni collaborates with various professionals in her field, including her coworker Ren-Guan Duan, to further enhance the impact of her innovations.

Conclusion

Sanni Sinikka Seppälä is a pioneering inventor whose work in fluoride coatings is shaping the future of chamber performance technologies. Her contributions are vital to advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…