Hwaseong, South Korea

SangYeop Lee

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: SangYeop Lee. Retrieved from https://idiyas.com/inventor/sangyeop-lee-e2lkuoyv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations of SangYeop Lee

Introduction

SangYeop Lee is an accomplished inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a patent that addresses critical challenges in reactor systems.

Latest Patents

SangYeop Lee holds a patent for a substrate processing apparatus. This apparatus is designed to remove signal interference between reactors. It includes a first reactor and a second reactor that is adjacent to the first. The system is equipped with a power generator that supplies first power to the first reactor and second power to the second reactor. Notably, the power generator is configured to synchronize the phases of both the first and second power, enhancing the efficiency of the reactors.

Career Highlights

SangYeop Lee is currently employed at ASML IP Holding B.V., a company known for its advanced technology in the semiconductor industry. His role involves developing innovative solutions that improve substrate processing techniques. His expertise in this area has positioned him as a valuable asset to his team.

Collaborations

SangYeop Lee collaborates with talented professionals such as KiChul Um and YongGyu Han. Together, they work on various projects that aim to push the boundaries of technology in substrate processing.

Conclusion

SangYeop Lee's contributions to substrate processing technology exemplify his innovative spirit and dedication to advancing the field. His patent and collaborative efforts highlight the importance of teamwork in achieving technological breakthroughs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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