Sangya Jain is a notable inventor based in Bridgewater, NJ (US). He has made significant contributions to the field of photoresist technology, holding a total of 10 patents. His work has advanced the capabilities of photosensitive compositions, particularly in the realm of negative working photoresists.

Latest Patents

Among his latest patents, Jain has developed an image reversal negative working photoresist containing O-quinone diazide. This innovative process allows for the conversion of a normally positive working photosensitive composition to a negative working composition. The composition includes an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound, and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. Additionally, he has created another image reversal negative working O-naphthoquinone diazide, which follows a similar process and boasts superior storage stability and shelf life.

Career Highlights

Sangya Jain has worked with prominent companies such as Hoechst Celanese Corporation and American Hoechst Corporation. His experience in these organizations has contributed to his expertise in the development of advanced photoresist technologies.

Collaborations

Throughout his career, Jain has collaborated with notable colleagues, including Donald C Mammato and Dana L Durham. These partnerships have further enriched his work and innovations in the field.

Conclusion

Sangya Jain's contributions to photoresist technology and his impressive portfolio of patents highlight his role as a significant inventor in the industry. His innovative processes continue to influence the development of photosensitive compositions, showcasing the importance of his work.

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