This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: Sangwook Lim: Innovator in Dielectric Layer Technology
Introduction
Sangwook Lim is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of dielectric materials.
Latest Patents
Sangwook Lim holds a patent for a method of forming a dielectric layer that includes dysprosium and scandium through atomic layer deposition. This innovative method involves supplying a first precursor containing dysprosium at a temperature below 400 degrees Celsius to a chamber with a substrate. A first reaction gas is then introduced to react with the first precursor. Following this, a second precursor containing scandium is supplied at a similar temperature, and a second reaction gas is used to facilitate the reaction. This patent is crucial for enhancing the performance of integrated circuit devices.
Career Highlights
Sangwook Lim is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work focuses on advancing semiconductor technologies, which are essential for modern electronic devices.
Collaborations
Sangwook Lim has collaborated with talented coworkers, including Sunjung Kim and Bongjin Kuh. Their combined expertise contributes to the innovative projects at Samsung Electronics.
Conclusion
Sangwook Lim's contributions to dielectric layer technology exemplify the importance of innovation in the semiconductor industry. His work continues to influence advancements in integrated circuit devices.