Sangdon Hwang

Title: The Innovative Contributions of Sangdon Hwang

Introduction

Sangdon Hwang is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of mask inspection technology, holding a total of 2 patents. His work has been instrumental in enhancing the efficiency and accuracy of mask inspection processes.

Latest Patents

Hwang's latest patents include a mask inspection apparatus and a mask inspection method using the same. The first patent describes a method that involves photographing a cell mask with openings to obtain an image. It sets an area adjacent to the edge of the cell mask as an inspection area, compares the grayscale of the openings in this area with a reference grayscale, and checks for defects based on the comparison results. The second patent outlines a method that includes obtaining an image of a mask with two regions, each containing multiple openings. This method involves sectioning the image into partial images corresponding to each region and inspecting them separately.

Career Highlights

Throughout his career, Sangdon Hwang has worked with prominent companies such as Samsung Display Co., Ltd. and Hims Co., Ltd. His experience in these organizations has contributed to his expertise in the field of mask inspection technology.

Collaborations

Hwang has collaborated with several professionals in his field, including Mihye Kwon and BongSuk Kim. These collaborations have likely enriched his work and led to innovative advancements in mask inspection methods.

Conclusion

Sangdon Hwang's contributions to mask inspection technology through his patents and career experiences highlight his role as an influential inventor. His work continues to impact the industry positively.