The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
Apr. 20, 2021
Samsung Display Co., Ltd., Yongin-si, KR;
Hims Co., Ltd., Incheon, KR;
Sangdon Hwang, Cheonan-si, KR;
BongSuk Kim, Cheonan-si, KR;
TaeHyun Kim, Incheon, KR;
Mihye Kwon, Asan-si, KR;
Ilha Song, Osan-si, KR;
Jimin Woo, Gyeongsan-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
HIMS CO., LTD., Incheon, KR;
Abstract
A mask inspection method including the steps of obtaining an image of a mask including a first region having a plurality of first openings, and a second region having a plurality of second openings, sectioning the image into a first partial image corresponding to the first region and a second partial image corresponding to the second region, respectively, inspecting the first region of the mask based on the first partial image, and inspecting the second region of the mask based on the second partial image.