Gyeongsan, South Korea

Jimin Woo

This inventor holds 1 USPTO granted patent. Top assignees: Hims Co., Ltd., Samsung Display Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jimin Woo. Retrieved from https://idiyas.com/inventor/jimin-woo-tf375kpr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Jimin Woo - Innovator in Mask Inspection Technology

Introduction

Jimin Woo is a notable inventor based in Gyeongsan, South Korea. He has made significant contributions to the field of mask inspection technology, which is crucial in various manufacturing processes. His innovative approach has led to the development of a unique patent that enhances the efficiency and accuracy of mask inspections.

Latest Patents

Jimin Woo holds a patent for a "Mask inspection apparatus and mask inspection method using the same." This patent describes a method that includes obtaining an image of a mask with distinct regions, sectioning the image into partial images, and inspecting each region based on these images. This method aims to improve the inspection process by ensuring that both the first and second regions of the mask are thoroughly analyzed.

Career Highlights

Throughout his career, Jimin Woo has worked with prominent companies such as Samsung Display Co., Ltd. and Hims Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology. His work has been instrumental in developing solutions that address industry challenges.

Collaborations

Jimin Woo has collaborated with talented individuals in his field, including Mihye Kwon and BongSuk Kim. These partnerships have fostered innovation and have led to the successful implementation of various projects.

Conclusion

Jimin Woo's contributions to mask inspection technology exemplify his dedication to innovation and excellence. His patent and career achievements highlight his role as a significant figure in the industry. His work continues to influence advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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