Cheonan, South Korea

BongSuk Kim

This inventor holds 1 USPTO granted patent. Top assignees: Hims Co., Ltd., Samsung Display Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: BongSuk Kim. Retrieved from https://idiyas.com/inventor/bongsuk-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations by BongSuk Kim

Introduction

BongSuk Kim is a notable inventor based in Cheonan, South Korea. He has made significant contributions to the field of technology, particularly in the area of mask inspection methods. His innovative approach has led to the development of a unique patent that enhances the efficiency of mask inspections.

Latest Patents

BongSuk Kim holds a patent for a "Mask inspection apparatus and mask inspection method using the same." This patent involves a method that includes obtaining an image of a mask with distinct regions, sectioning the image into partial images, and inspecting each region based on these images. This method aims to improve the accuracy and reliability of mask inspections in various applications.

Career Highlights

Throughout his career, BongSuk Kim has worked with prominent companies such as Samsung Display Co., Ltd. and Hims Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in technology.

Collaborations

BongSuk Kim has collaborated with talented individuals in his field, including Mihye Kwon and Sangdon Hwang. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

BongSuk Kim's contributions to the field of mask inspection technology highlight his innovative spirit and dedication to advancing industry standards. His work continues to influence the way mask inspections are conducted, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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