Stanford, CA, United States of America

Sang-Yun Lee


Average Co-Inventor Count = 9.2

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2004-2005

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3 patents (USPTO):Explore Patents

Title: Innovations by Inventor Sang-Yun Lee

Introduction

Sang-Yun Lee is an accomplished inventor based in Stanford, California, recognized for her contributions in the field of semiconductor technology. With a total of three patents to her name, she has significantly impacted the development of dual damascene structures, which are crucial in modern electronic devices.

Latest Patents

Sang-Yun Lee's latest patent addresses the method of preventing resist poisoning in dual damascene structures. This innovative method involves the formation of a dual damascene interconnect within a dielectric layer. The process begins with the etching of a first aperture in the dielectric. Following this, a poison barrier layer is strategically formed over part of the dielectric, effectively preventing resist poisoning. A patterned mask is then created over this barrier layer, and a second aperture is etched into the dielectric layer. Notably, at least part of the first aperture shares the same area as part of the second aperture, optimizing the design and functionality of the interconnect.

Career Highlights

As a key member of LSI Logic Corporation, Sang-Yun Lee has played a vital role in advancing semiconductor manufacturing technologies. Her work has enhanced the reliability and efficiency of electronic components, marking her as a valuable asset in her field.

Collaborations

Sang-Yun collaborates with notable colleagues including Yongbae Kim and Hiroaki Takikawa, contributing to a team that is dedicated to pushing the boundaries of semiconductor innovations. Their combined efforts have fostered an environment of creative problem-solving and technical excellence.

Conclusion

In conclusion, Sang-Yun Lee stands out as an inventive force in the semiconductor industry. Her latest patent not only showcases her ingenuity but also exemplifies the critical advancements being made in dual damascene technology. Her collaboration with talented peers further enriches the innovations coming from LSI Logic Corporation, solidifying her reputation as a leading inventor in her field.

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