Yongin, South Korea

Sang Seung Park

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Enf Technology Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sang Seung Park. Retrieved from https://idiyas.com/inventor/sang-seung-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Sang Seung Park in Semiconductor Manufacturing

Introduction

Sang Seung Park is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing through his innovative patent. His work focuses on enhancing the etching process for titanium-containing metal layers, which is crucial in the production of semiconductor and display devices.

Latest Patents

Sang Seung Park holds a patent for an etchant composition specifically designed for titanium-containing metal layers. This invention provides a method that selectively etches the titanium-containing metal layer without compromising the quality of other films. The etching characteristics of this composition improve productivity and reliability in semiconductor manufacturing processes.

Career Highlights

Sang Seung Park is associated with Enf Technology Co., Ltd., where he applies his expertise in semiconductor technology. His innovative approach has positioned him as a key figure in the development of advanced manufacturing techniques.

Collaborations

He collaborates with talented coworkers, including Yang Ryoung Kim and Bo Yeon Lee, who contribute to the innovative environment at Enf Technology Co., Ltd. Their combined efforts enhance the research and development capabilities of the company.

Conclusion

Sang Seung Park's contributions to semiconductor manufacturing through his patent demonstrate his commitment to innovation and excellence in the field. His work not only improves manufacturing processes but also sets a standard for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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