The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Jan. 19, 2023
Applicant:
Enf Technology Co., Ltd., Yongin-si, KR;
Inventors:
Sang Seung Park, Yongin-si, KR;
Yang Ryoung Kim, Yongin-si, KR;
Bo Yeon Lee, Yongin-si, KR;
Min Gyeong Jeong, Yongin-si, KR;
Se Hoon Kim, Yongin-si, KR;
Assignee:
ENF TECHNOLOGY CO., LTD., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/40 (2006.01); H01L 21/02 (2006.01); H01L 21/3205 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
C23F 1/40 (2013.01); H01L 21/0214 (2013.01); H01L 21/02164 (2013.01); H01L 21/32051 (2013.01); H01L 21/32134 (2013.01);
Abstract
Provided are an etchant composition for a titanium-containing metal layer, and a method using the same, which may selectively etch the titanium-containing metal layer without affecting the quality of other films during a process of manufacturing semiconductor and display devices, and thus, may increase productivity and reliability with improved etching characteristics in a semiconductor manufacturing process.