Yongin, South Korea

Min Gyeong Jeong

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Enf Technology Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min Gyeong Jeong. Retrieved from https://idiyas.com/inventor/min-gyeong-jeong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Min Gyeong Jeong: Innovator in Semiconductor Manufacturing

Introduction

Min Gyeong Jeong is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing through his innovative work. His expertise lies in developing etchant compositions that enhance the efficiency and reliability of manufacturing processes.

Latest Patents

Min Gyeong Jeong holds a patent for an etchant composition specifically designed for titanium-containing metal layers. This invention provides a method that selectively etches titanium without compromising the quality of other films. The etching characteristics of this composition improve productivity and reliability in semiconductor and display device manufacturing.

Career Highlights

Min Gyeong Jeong is currently employed at Enf Technology Co., Ltd. His work at this company has allowed him to focus on advancing technologies that are crucial for the semiconductor industry. His contributions have been instrumental in enhancing manufacturing processes.

Collaborations

Min Gyeong Jeong collaborates with talented individuals such as Sang Seung Park and Yang Ryoung Kim. Their teamwork fosters innovation and drives advancements in their field.

Conclusion

Min Gyeong Jeong's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to improving industry standards. His work continues to influence the efficiency and reliability of manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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