Yongin, South Korea

Bo Yeon Lee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Enf Technology Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bo Yeon Lee. Retrieved from https://idiyas.com/inventor/bo-yeon-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Bo Yeon Lee: Innovator in Semiconductor Manufacturing

Introduction

Bo Yeon Lee is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing through his innovative work. His expertise lies in developing etchant compositions that enhance the efficiency and reliability of manufacturing processes.

Latest Patents

Bo Yeon Lee holds a patent for an etchant composition specifically designed for titanium-containing metal layers. This invention provides a method that selectively etches titanium-containing metal layers without compromising the quality of other films. The etching characteristics of this composition improve productivity and reliability in semiconductor and display device manufacturing.

Career Highlights

Lee is currently associated with Enf Technology Co., Ltd., where he applies his knowledge and skills to advance semiconductor technologies. His work has been instrumental in developing solutions that address challenges in the manufacturing process.

Collaborations

Throughout his career, Bo Yeon Lee has collaborated with notable colleagues, including Sang Seung Park and Yang Ryoung Kim. These partnerships have fostered innovation and contributed to the success of various projects within the company.

Conclusion

Bo Yeon Lee's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to enhancing industry standards. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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