Daejeon, South Korea

Sang Chan Lee

This inventor holds 2 USPTO granted patents. Top assignee: Dnf Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sang Chan Lee. Retrieved from https://idiyas.com/inventor/sang-chan-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: The Innovations of Sang Chan Lee

Introduction

Sang Chan Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of metal compounds for thin film applications. His innovative work has led to the creation of a patented technology that enhances the efficiency of metal thin film deposition.

Latest Patents

Sang Chan Lee holds a patent for an iodine-containing metal compound and a composition for depositing a thin film that includes this compound. The patent describes a method for manufacturing a metal-containing thin film using a composition that remains in a liquid state at room temperature. This characteristic provides excellent storage and handling properties. Additionally, the high reactivity of the composition allows for efficient formation of metal thin films.

Career Highlights

Sang Chan Lee is associated with DNF Co., Ltd., where he continues to work on innovative solutions in the field of thin film technology. His expertise and dedication to research have positioned him as a key figure in his company and the industry.

Collaborations

Sang Chan Lee collaborates with talented coworkers, including Yong Hee Kwone and Young Jae Im. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Sang Chan Lee's contributions to the development of iodine-containing metal compounds and thin film deposition methods highlight his innovative spirit and commitment to advancing technology. His work continues to influence the materials science landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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