Company Filing History:
Years Active: 2006
Title: Innovations by Sandra L. Rosenberg in Chemical Mechanical Polishing
Introduction
Sandra L. Rosenberg is a prominent inventor based in San Jose, CA, known for her significant contributions to the field of chemical mechanical polishing. With two patents to her name, she has made remarkable advancements that enhance the efficiency and effectiveness of semiconductor substrate polishing technologies.
Latest Patents
Rosenberg's latest patents include a "Chemical Mechanical Polishing Apparatus with Rotating Belt," which features a rotatable platen and a polishing sheet allowing for enhanced substrate handling. The design includes two reels and a drive mechanism for advancing the polishing sheet, along with a chucking mechanism to intermittently secure the sheet to the platen.
Her second patent, titled "Article for Polishing Semiconductor Substrates," introduces a method and apparatus incorporating fixed abrasive polishing pads with variable post designs. These posts differ in shape, size, height, material, distribution of abrasive particles, and process chemicals. This innovation also specifies the preconditioning of abrasive articles to achieve uniform texture and discusses in situ rate measurement devices that incorporate a mechanical method to gauge abrasive web consumption.
Career Highlights
Sandra is affiliated with Applied Materials, Inc., a leading company in the semiconductor and display technology industry. Her work has positioned her as a key contributor to advancements in polishing technologies, making her an influential figure within the sector.
Collaborations
Throughout her career, Rosenberg has collaborated with notable colleagues such as Manoocher Birang and John M. White. Their combined expertise and innovation drive have fostered advancements in technology that benefit the industry at large.
Conclusion
Sandra L. Rosenberg continues to advance the field of chemical mechanical polishing through her innovative inventions. Her patents play a crucial role in enhancing semiconductor polishing techniques, reflecting her commitment to progress in technology and engineering. Through collaborations with esteemed colleagues and her work at Applied Materials, Inc., she exemplifies the spirit of innovation in modern engineering.