The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
May. 03, 2004
Manoocher Birang, Los Gatos, CA (US);
Sandra L. Rosenberg, Legal Representative, San Jose, CA (US);
Sasson Somekh, Los Altos Hills, CA (US);
John M White, Hayward, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Sandra L. Rosenberg, legal representative, San Jose, CA (US);
Sasson Somekh, Los Altos Hills, CA (US);
John M White, Hayward, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A chemical mechanical polishing apparatus has a rotatable platen, a polishing sheet that is wider than the substrate extending between two reels, a drive mechanism to advance the polishing sheet, and a chucking mechanism to intermittently secure the polishing sheet to the platen. The platen can have a platen base that is adaptable to receive either a circular platen top or a rectangular platen top.