Cold Spring, NY, United States of America

Sandi E Merritt


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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2 patents (USPTO):Explore Patents

Title: Sandi E Merritt: Innovator in Semiconductor Cleaning Solutions

Introduction

Sandi E Merritt is a notable inventor based in Cold Spring, NY (US). She has made significant contributions to the field of semiconductor cleaning systems, holding 2 patents that showcase her innovative approach to improving cleaning processes.

Latest Patents

Merritt's latest patents include a groundbreaking system for partial solution replacement in recyclable persulfuric acid cleaning systems. This invention involves a cleaning vessel designed to clean semiconductor wafers immersed in a bath of persulfuric acid cleaning solution. The system circulates the cleaning solution through a primary process tool fluid path and includes a secondary fluid path that diverts a portion of the cleaning solution for electrolysis treatment. The electrolysis reactor within this path receives oxidant-depleted sulfuric acid, where electrodes activate to oxidize sulfate ions and form persulfate ions. These ions are then recombined with fluid from the primary fluid path and fed back to the cleaning vessel. Additionally, her method for implementing cleaning solution replacement involves monitoring electrode voltage and operating time until a trigger point is reached, ensuring efficient cleaning fluid management.

Career Highlights

Merritt is currently employed at International Business Machines Corporation (IBM), where she continues to develop innovative solutions in the semiconductor industry. Her work has significantly impacted the efficiency and effectiveness of cleaning processes used in semiconductor manufacturing.

Collaborations

Some of her notable coworkers include Richard O Henry and David F Hilscher, who have collaborated with her on various projects within the company.

Conclusion

Sandi E Merritt's contributions to semiconductor cleaning technology reflect her dedication to innovation and excellence in her field. Her patents demonstrate a commitment to improving processes that are vital to the semiconductor industry.

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