The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Nov. 14, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Richard O. Henry, Newburgh, NY (US);

David F. Hilscher, Lagrange, NY (US);

Sandi E. Merritt, Cold Spring, NY (US);

Charles J. Taft, Wappingers Falls, NY (US);

Robert W. Zigner, Jr., Hyde Park, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 27/26 (2006.01); H01L 21/67 (2006.01); G01N 27/416 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67057 (2013.01); G01N 27/4161 (2013.01); H01L 21/02052 (2013.01); H01L 21/67017 (2013.01);
Abstract

A recyclable fluid cleaning system wafers includes a cleaning vessel configured to clean semiconductor wafers immersed in a bath of persulfuric acid cleaning solution, the cleaning solution circulated through a primary process tool fluid path; a secondary fluid path that diverts a portion of the persulfuric acid cleaning solution for electrolysis treatment thereof; an electrolysis reactor within the secondary fluid path that receives oxidant depleted sulfuric acid, the electrolysis reactor having electrodes that, when activated causes sulfate ions in the solution to be oxidized and form persulfate ions that are recombined with fluid from the primary fluid path and fed back to the cleaning vessel; and one or more controller devices in operative communication with the cleaning vessel and with the electrolysis reactor.


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