Company Filing History:
Years Active: 2007
Title: **Innovator Spotlight: San-An Lin and His Contributions to Plasma Technology**
Introduction
San-An Lin, an esteemed inventor located in Tainan, Taiwan, has made significant strides in the field of plasma technology. With at least one patented innovation to his name, Lin is recognized for his unique approach to enhancing the processes involved in chemical vapor deposition (CVD), which is crucial for various industrial applications.
Latest Patents
San-An Lin holds a patent for a groundbreaking invention titled "Plasma apparatus and method capable of adaptive impedance matching." This innovative device includes a plasma reactor designed to generate plasma for the CVD process. It features a bi-polar electrostatic chuck integrated within the reactor to securely support wafers during processing. The apparatus employs an alternating current bias power supply linked to the chuck, delivering voltage potential biases essential for ion-bombardment via plasma. Moreover, an impedance-matching circuit connects the power supply to the electrostatic chuck, effectively balancing power outputs from the inner and outer electrodes, thereby enhancing the performance of the apparatus.
Career Highlights
San-An Lin currently works at United Microelectronics Corporation, a prominent player in the semiconductor manufacturing industry. His role involves the development of advanced technologies that improve production efficiency and product quality in the semiconductor sector. Lin’s innovative mindset enables him to contribute significantly to the company's R&D efforts, focusing on plasma-based solutions.
Collaborations
Throughout his career, San-An Lin has collaborated with notable colleagues, including Chien-Hsin Lai and Kuo-En Yen. These partnerships have allowed for the exchange of ideas, fostering an environment of creativity and innovation within their projects. Together, they work on advancing technologies that impact the semiconductor and manufacturing fields.
Conclusion
San-An Lin stands out as a remarkable inventor whose advancements in plasma technology could pave the way for future innovations in the semiconductor industry. With his patented methods and collaborative efforts, he continues to push the boundaries of what is possible, contributing to a more efficient and effective manufacturing process. His work not only exemplifies individual brilliance but also highlights the importance of teamwork in achieving groundbreaking innovations.