Chennai, India

Samit Barai

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Samit Barai. Retrieved from https://idiyas.com/inventor/samit-barai-6njtbwxq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Samit Barai and Virtual Substrate Measurement

Introduction

Samit Barai is an inventor based in Chennai, India, and works at Applied Materials, Inc. His patent work includes a method for measuring substrate characteristics through a virtual substrate displayed in a graphical user interface.

Latest Patents

The provided information identifies one patent associated with Barai: “Determining Substrate Characteristics by Virtual Substrate Measurement.” The method receives data describing features of a virtual substrate and prepares the substrate for display in a graphical user interface. A user selects one or more locations, which are used to define a three-dimensional measurement probe. The system then outputs a measurement of a substrate characteristic captured by that probe. Barai is credited with 1 patent.

Career Highlights

Barai’s listed invention focuses on using interactive virtual representations and three-dimensional measurement probes to assess substrate characteristics. He is associated with Applied Materials, Inc., a company working in the materials engineering and semiconductor equipment field.

Collaborations

The provided information lists Dheeraj Kumar and Pardeep Kumar as Barai’s coworkers. Their shared professional association reflects a collaborative workplace context, though specific joint patent contributions are not stated.

Conclusion

Samit Barai’s patent describes a graphical, probe-based approach to measuring characteristics of a virtual substrate, highlighting his contribution to technology related to substrate analysis.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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