Samira Bahrami

Title: Samira Bahrami: Innovator in Metrology

Introduction

Samira Bahrami is a notable inventor based in Amsterdam, Netherlands. She has made significant contributions to the field of metrology, particularly through her innovative methods and technologies. Her work focuses on enhancing the accuracy and efficiency of measurement techniques.

Latest Patents

Samira Bahrami holds one patent titled "Metrology method and associated computer product." This patent discloses a method that involves measuring radiation reflected from a metrology target and decomposing the measured radiation into components, such as Fourier components or spatial components. Additionally, the patent introduces a recipe selection method that provides an algorithm to select a parameter of the metrology apparatus based on recalculated dependencies of the measured radiation.

Career Highlights

Samira is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. Her role involves developing advanced metrology techniques that are crucial for the production of high-precision semiconductor devices. Her expertise in this area has positioned her as a valuable asset to her team and the industry.

Collaborations

Throughout her career, Samira has collaborated with talented individuals, including Narjes Javaheri and Maurits Van Der Schaar. These collaborations have fostered innovation and have contributed to the advancement of metrology methods.

Conclusion

Samira Bahrami's work in metrology exemplifies the impact of innovative thinking in technology. Her contributions continue to shape the future of measurement techniques in the semiconductor industry.