Newark, CA, United States of America

Samantha Sh Tan

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.7

ph-index = 1

Forward Citations = 53(Granted Patents)


Company Filing History:


Years Active: 2016-2025

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3 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Samantha Sh Tan

Introduction

Samantha Sh Tan, an accomplished inventor based in Newark, California, has made significant contributions to the field of lithography. With a focus on addressing challenges posed by stochastic effects in manufacturing processes, his innovative work showcases the intersection of engineering and creativity.

Latest Patents

Samantha holds a notable patent titled "Eliminating yield impact of stochastics in lithography." This patent encompasses methods and apparatuses designed for performing cycles of aspect ratio-dependent deposition and aspect ratio-independent etching on lithographically patterned substrates. The described methods aim to reduce variations in feature depths and aspect ratios, particularly concerning features affected by stochastic effects. His work is particularly relevant for processing substrates with photoresist following extreme ultraviolet lithography, involving advanced deposition and etching techniques.

Career Highlights

Samantha is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role involves pioneering research and development efforts that push the boundaries of lithography technology. His innovative approaches contribute significantly to improving manufacturing efficiency and product yield.

Collaborations

Throughout his career, Samantha has collaborated with other esteemed professionals in the field, including his coworker Nader Shamma. These collaborations have fostered an environment of creativity and knowledge sharing, further enhancing the advancements in lithography techniques.

Conclusion

Samantha Sh Tan's contributions to the field of lithography underscore the importance of innovation in advancing technology. His patent reflects a commitment to overcoming challenges associated with stochastic effects, solidifying his status as a prominent figure in the semiconductor industry. As a result of his work, manufacturers can look forward to improved processes and enhanced product quality, showcasing the impact of inventive thinking in real-world applications.

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