Company Filing History:
1 out of 309 
1 out of 23 Years Active: 2015
Title: Sakiko Nakashima: Innovator in Chemical Mechanical Polishing
Introduction
Sakiko Nakashima is a prominent inventor based in Kyoto, Japan. She has made significant contributions to the field of chemical mechanical polishing, particularly in the polishing of silicon wafers. Her innovative work has led to the development of a unique chemical mechanical polishing composition that is essential for the semiconductor industry.
Latest Patents
Sakiko Nakashima holds 1 patent for her invention titled "Chemical mechanical polishing composition for polishing silicon wafers and related methods." This composition includes water, an optional abrasive, a cation, piperazine or a piperazine derivative, and a quaternary ammonium compound. The composition is designed to exhibit a pH of 9 to 12, making it effective for polishing silicon wafers. Additionally, she has provided methods for making and using this composition, showcasing her expertise in the field.
Career Highlights
Throughout her career, Nakashima has worked with notable companies such as Rohm and Haas Electronic Materials CMP Holdings, Inc. and Nitta Haas Inc. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in chemical mechanical polishing technologies.
Collaborations
Sakiko has collaborated with esteemed colleagues, including Yasuyuki Itai and Naresh Kumar Penta. These partnerships have further enhanced her research and development efforts in the field.
Conclusion
Sakiko Nakashima is a trailblazer in the realm of chemical mechanical polishing, with her innovative patent playing a crucial role in the semiconductor industry. Her contributions and collaborations reflect her dedication to advancing technology in this vital area.