Sakae Tanaka

Title: Sakae Tanaka: Innovator in Semiconductor Equipment

Introduction

Sakae Tanaka is a notable inventor based in Goka-Machi, Japan. He has made significant contributions to the field of semiconductor fabrication equipment, holding 2 patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is a shadow frame with a cross beam for semiconductor equipment. This invention comprises a rectangular frame with four edges, forming an interior lip with a top surface and a bottom engagement surface. The cross beam is disposed between at least two edges of the frame, featuring a top surface and a bottom engagement surface. The engagement surface of the cross beam is designed to be flush with the engagement surface of the lip. This design ensures that one or more of the engagement surfaces cover metal interconnect bonding areas on a carrier located below the frame. The shadow frame is particularly useful in plasma enhanced chemical vapor deposition (PECVD) applications, which are essential for manufacturing active matrix liquid crystal displays (AMLCDs) and solar cells.

Career Highlights

Sakae Tanaka is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Sakae has collaborated with talented individuals such as Qunhua Wang and Sanjay D Yadav. These collaborations have contributed to the advancement of technology in the semiconductor field.

Conclusion

Sakae Tanaka's contributions to semiconductor equipment through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative designs continue to impact the manufacturing of advanced technologies.