The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2005
Filed:
Apr. 25, 2002
Sakae Tanaka, Ibaraki-ken, JP;
Qunhua Wang, San Jose, CA (US);
Sanjay Yadav, Redwood City, CA (US);
Quanyuan Shang, Saratoga, CA (US);
William R. Harshbarger, San Jose, CA (US);
Sakae Tanaka, Ibaraki-ken, JP;
Qunhua Wang, San Jose, CA (US);
Sanjay Yadav, Redwood City, CA (US);
Quanyuan Shang, Saratoga, CA (US);
William R. Harshbarger, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A shadow frame and framing system for semiconductor fabrication equipment comprising a rectangular frame having four edges, the edges forming an interior lip with a top surface and an bottom engagement surface; and a cross beam disposed between at least two edges of the frame, the cross beam having a top surface and a bottom engagement surface, the engagement surface of the cross beam configured to be flush with the engagement surface of the lip; wherein one or more of the engagement surfaces are configured to cover metal interconnect bonding areas on a carrier disposed below the frame. The shadow frame is particularly useful in plasma enhanced chemical vapor deposition (PECVD) applications used to make active matrix liquid crystal displays (AMLCDs) and solar cells.