Sahag R Dakesian

Title: Sahag R Dakesian: Innovator in Thin Film Technology

Introduction

Sahag R Dakesian is a notable inventor based in Sudbury, MA (US). He has made significant contributions to the field of thin film technology, particularly through his innovative methods for applying adherent layers to substrates. His work has implications in various industries, including electronics and materials science.

Latest Patents

Dakesian holds a patent for a method titled "Method for applying a thin adherent layer." This patent describes a technique for depositing an extremely thin layer of an adherent material, such as titanium, onto a silicon dioxide substrate. The method allows for precise control over the deposition rate, ensuring that the layer is applied effectively while maintaining the integrity of the substrate. The process involves placing a silicon wafer on a titanium precoated carrier within an evacuated chamber, where it undergoes sputter etching and deposition simultaneously.

Career Highlights

Sahag R Dakesian is associated with Raytheon Company, where he has contributed to advancements in technology and innovation. His expertise in thin film applications has positioned him as a valuable asset in the field. Dakesian's work is characterized by a commitment to enhancing the performance and reliability of electronic components through innovative material applications.

Collaborations

Dakesian has collaborated with William E Wesolowski, furthering research and development in their respective fields. Their partnership exemplifies the importance of teamwork in driving innovation and achieving technological advancements.

Conclusion

Sahag R Dakesian's contributions to thin film technology and his innovative methods for applying adherent layers have made a significant impact in the industry. His work continues to influence advancements in materials science and electronics, showcasing the importance of innovation in driving progress.