Toyama, Japan

Sadayasu Suyama

This inventor holds 1 USPTO granted patent. Top assignee: Kokusai Electric Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sadayasu Suyama. Retrieved from https://idiyas.com/inventor/sadayasu-suyama-znvexutp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sadayasu Suyama

Introduction

Sadayasu Suyama is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology. His work focuses on methods that enhance the processing of substrates, which are crucial in the manufacturing of semiconductor devices.

Latest Patents

Suyama holds a patent for a "Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus." This innovative technique involves forming a modified layer by altering a portion of an oxide film on a substrate. The process includes supplying a fluorine-containing gas and a first reducing gas to the substrate multiple times. After the modified layer is created, the fluorine-containing gas is supplied again to optimize the substrate's properties.

Career Highlights

Sadayasu Suyama is associated with Kokusai Electric Corporation, a leading company in the semiconductor industry. His expertise in substrate processing has positioned him as a valuable asset within the organization. His innovative approaches have contributed to advancements in semiconductor manufacturing techniques.

Collaborations

Suyama has worked alongside talented colleagues such as Kaichiro Minami and Naonori Akae. Their collaborative efforts have fostered an environment of innovation and creativity within their projects.

Conclusion

Sadayasu Suyama's contributions to semiconductor technology through his patented methods demonstrate his commitment to innovation. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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