Tokyo, Japan

Sadatatsu Ikeda

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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3 patents (USPTO):Explore Patents

Title: Sadatatsu Ikeda: Innovator in Reflective Mask Technology

Introduction

Sadatatsu Ikeda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of reflective mask technology, holding a total of 3 patents. His work focuses on advancements that enhance the efficiency and effectiveness of reflective masks used in various applications.

Latest Patents

Ikeda's latest patents include innovative designs for reflective mask blanks. One of his notable inventions is a reflective mask blank that consists of a substrate, a multilayered reflection film designed to reflect extreme ultraviolet (EUV) rays, a protection film to safeguard the multilayered reflection film, and an absorption film to absorb the EUV rays. The protection film is primarily composed of Rh, while the multilayered reflection film features an uppermost layer containing Si and N. The specific element ratios of N to Si and O to Si are carefully controlled to optimize performance. Another patent involves a reflective mask blank that includes a multilayer reflective film and an absorber film made from a tantalum-based material. This absorber film exhibits distinct characteristics in X-ray diffraction patterns, indicating its effectiveness in EUV light absorption.

Career Highlights

Sadatatsu Ikeda is currently associated with AGC Inc., a leading company in the field of glass and materials technology. His work at AGC Inc. has allowed him to push the boundaries of innovation in reflective mask technology, contributing to advancements that are crucial for various industries.

Collaborations

Ikeda has collaborated with notable colleagues such as Hiroshi Hanekawa and Tsuyoshi Kakuta. These collaborations have fostered a creative environment that encourages the exchange of ideas and expertise, further enhancing the quality of their innovations.

Conclusion

Sadatatsu Ikeda's contributions to reflective mask technology exemplify the spirit of innovation. His patents reflect a deep understanding of materials and their applications, positioning him as a key figure in this specialized field. His work continues to influence advancements in technology, making a lasting impact on the industry.

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