Tokyo, Japan

Sadahiro Nonoyama

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sadahiro Nonoyama. Retrieved from https://idiyas.com/inventor/sadahiro-nonoyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: **Sadahiro Nonoyama: Innovator of Semiconductor Simulation Models**

Introduction

Sadahiro Nonoyama, based in Tokyo, Japan, is a dedicated inventor known for his contributions in the field of semiconductor technology. With a focus on enhancing the accuracy of IBIS (I/O Buffer Information Specification) simulation models, Nonoyama has developed a significant innovation that holds potential benefits for the semiconductor industry.

Latest Patents

Nonoyama holds one patent titled "Method for extracting IBIS simulation model." This patent outlines a sophisticated method for accurately extracting an IBIS simulation model of a semiconductor device that includes multiple semiconductor chips. The procedure involves several key steps, including extracting an AC characteristics model of output buffers, calculating the output capacitance model, and synthesizing the overall IBIS simulation model viewed from the external connection terminal. This innovation is expected to streamline the design and analysis of semiconductor devices.

Career Highlights

Throughout his career, Nonoyama has dedicated his efforts to advancing semiconductor technology, showcasing his innovative spirit through his patent. His work aims to bridge the gap between theoretical simulations and practical applications, contributing to the enhancement of semiconductor device performance.

Collaborations

In his professional journey, Sadahiro Nonoyama has collaborated with esteemed colleagues such as Tadaaki Yoshimura and Yoji Nishio. Together, they have worked on various projects that focus on improving the methodologies used in semiconductor simulations, fostering an environment of innovation and excellence.

Conclusion

Sadahiro Nonoyama represents a significant figure in the realm of semiconductor inventions, particularly with his method for extracting IBIS simulation models. His passion for innovation and collaboration with other talented individuals in the field contribute to the ongoing evolution of technology in semiconductor devices. As the industry progresses, Nonoyama’s contributions will undoubtedly play a vital role in shaping the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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