S Y Chen

Title: S Y Chen - Innovator in Image Sensor Technology

Introduction

S Y Chen is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of image sensor technology. His innovative work has led to the development of a unique pad structure in image sensors, enhancing their functionality and performance.

Latest Patents

S Y Chen holds a patent for an "Image sensor with pad structure." This patent describes the formation of a pad structure in an image sensor device using a sacrificial isolation region and a silicon oxide-based stack without intervening nitride etch-stop layers. The image sensor device includes a semiconductor layer with a first horizontal surface opposite to a second horizontal surface. A metallization layer is formed on the second horizontal surface of the semiconductor layer, which includes a dielectric layer. Additionally, the device features a pad region that traverses through the semiconductor layer, incorporating an oxide layer with no intervening nitride layers formed on the dielectric layer of the metallization layer. The pad structure is in physical contact with a conductive structure of the metallization layer. S Y Chen has 1 patent to his name.

Career Highlights

S Y Chen is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to push the boundaries of image sensor technology and contribute to advancements in the field.

Collaborations

S Y Chen has collaborated with notable colleagues, including Huai-jen Tung and Ching-Chung Su. Their combined expertise has fostered innovation and development in their projects.

Conclusion

S Y Chen is a key figure in the advancement of image sensor technology, with a focus on innovative structures that improve device performance. His contributions continue to influence the semiconductor industry and pave the way for future advancements.