Tanakajd, Hungary

Róbert Bósze

This inventor holds 1 USPTO granted patent. Top assignee: Tdk Electronics Ag. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Róbert Bósze. Retrieved from https://idiyas.com/inventor/róbert-bósze

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Róbert Bósze: Innovator in Electrolytic Capacitors

Introduction

Róbert Bósze is a notable inventor based in Tanakajd, Hungary. He has made significant contributions to the field of electronics, particularly in the development of electrolytic capacitors. His innovative approach has led to the creation of a unique patent that enhances the functionality of these essential components.

Latest Patents

Róbert Bósze holds a patent for an "Electrolytic capacitor with controlling element for gas diffusion." This invention comprises a case, a capacitor element mounted within the case, and an element designed to control gas diffusion between the inside and outside of the case. The controlling element is embedded within the case, providing improved performance and reliability.

Career Highlights

Bósze is currently employed at TDK Electronics AG, a company known for its advancements in electronic components. His work at TDK has allowed him to collaborate with other talented professionals in the field, further enhancing his expertise and contributions to the industry.

Collaborations

Some of Róbert Bósze's coworkers include Gábor Székely and Ottó Klug. Their collaborative efforts have likely contributed to the innovative environment at TDK Electronics AG, fostering the development of cutting-edge technologies.

Conclusion

Róbert Bósze is a distinguished inventor whose work in electrolytic capacitors has made a significant impact in the electronics industry. His patent demonstrates his commitment to innovation and excellence in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…