Location History:
- Ohizumi-machi, JP (2011)
- Shizuoka, JP (2012)
Company Filing History:
Years Active: 2011-2012
Title: Ryuta Shimazaki: Innovator in Miniaturized Pattern Formation
Introduction
Ryuta Shimazaki is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of pattern formation, particularly in the development of methods that enhance production efficiency while minimizing costs. With a total of 2 patents, his work is recognized for its innovative approach to resist substrate treatment solutions.
Latest Patents
Shimazaki's latest patents include a method for the formation of miniaturized patterns and a resist substrate treatment solution for use in this method. The first patent provides a technique for miniaturizing a pattern without significantly increasing production costs or impairing efficiency. This invention also introduces a fine resist pattern and a resist substrate-treating solution that aids in forming the fine pattern. The method involves treating a resist pattern after development with a solution containing an amino group, specifically a tertiary polyamine-containing water-soluble polymer, to reduce the effective size of the resist pattern.
The second patent addresses the processing liquid for resist substrates and outlines a method for processing resist substrates using this solution. This invention effectively resolves issues such as foreign substances on the substrate surface, pattern collapse, and pattern roughness. The treating solution consists of water and an alkylene oxide adduct of a primary amine with a hydrocarbon group of 11 to 30 carbon atoms or ammonia. The method for pattern formation includes a step of treating the developed pattern with this solution.
Career Highlights
Throughout his career, Ryuta Shimazaki has worked with prominent companies, including Az Electronic Materials USA Corp. and Merck Patent GmbH. His experience in these organizations has contributed to his expertise in the field of pattern formation and resist substrate treatment.
Collaborations
Some of his notable coworkers include Go Noya and Masakazu Kobayashi, who have collaborated with him on various projects.
Conclusion
Ryuta Shimazaki's innovative work in the field of miniaturized pattern formation and resist substrate treatment solutions showcases his commitment to advancing technology. His patents reflect a deep understanding of the challenges in production processes and offer practical solutions that benefit the industry.