Ikeda, Japan

Ryuta Isobe

This inventor holds 1 USPTO granted patent. Top assignee: Ricoh Company, Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuta Isobe. Retrieved from https://idiyas.com/inventor/ryuta-isobe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Ryuta Isobe: Innovator in Semiconductor Technology

Introduction

Ryuta Isobe is a notable inventor based in Ikeda, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device that incorporates advanced features.

Latest Patents

Ryuta Isobe holds a patent for a semiconductor device with a fuse. This device includes a semiconductor substrate, a base insulating layer, a silicon fuse, a pair of silicon wires, a silicon guard ring, an insulation coating, a first interlayer insulating layer, a via guard ring, a metal guard ring, a final insulating layer, and a fuse window. The design ensures enhanced functionality and reliability in semiconductor applications.

Career Highlights

Isobe is currently employed at Ricoh Company, Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices.

Collaborations

Ryuta Isobe has collaborated with notable colleagues such as Masashi Oshima and Masaya Ohtsuka. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Ryuta Isobe's contributions to semiconductor technology exemplify the spirit of innovation. His patent and ongoing work at Ricoh Company, Ltd. highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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