Ryusuke Komura

Title: Innovations by Ryusuke Komura in Semiconductor Technology.

Introduction

Ryusuke Komura is a notable inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of semiconductor technology, particularly with his innovative patent that enhances the manufacturing process of semiconductor wafers. His work is recognized for its practical applications in the industry.

Latest Patents

One of Ryusuke Komura's key patents is titled "Semiconductor base material having fine dot mark." This invention features a dot mark with a peaked portion that rises from the surface of a semiconductor wafer. The dot mark is designed to be applied on a cut or ground face of the wafer, which has a surface roughness of 0.3 µm or less. The maximum length of the dot mark ranges from 1 to 15 µm, with a height of 0.01 to 5 µm. Despite its fine size, the dot mark maintains superior visibility, allowing for the recognition of processing histories, wafer IDs, chip IDs, and manufacturing numbers.

Career Highlights

Ryusuke Komura is currently employed at Komatsu Corporation, where he continues to innovate in the semiconductor field. His work has contributed to advancements in manufacturing processes and product identification, which are crucial for the semiconductor industry.

Collaborations

Some of his notable coworkers include Teiichirou Chiba and Akira Mori, who collaborate with him on various projects within the company.

Conclusion

Ryusuke Komura's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the industry. His work not only enhances manufacturing processes but also improves product traceability, making a significant impact in the field.