The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2002
Filed:
Oct. 13, 2000
Komatsu Limited, Tokyo, JP;
Abstract
A dot mark having at its center a peaked portion rising from a face to be marked is provided on a cut face or ground face of a semiconductor wafer with the face to be marked having surface roughness of 0.3 &mgr;m or less. The rising dot mark is 1 to 15 &mgr;m in maximum length along the face to be marked and 0.01 to 5 &mgr;m in height. With even such a fine size, the dot mark is superior in visibility. This makes it possible to provide a semiconductor base material in which all processing histories in a process for manufacturing a semiconductor wafer and a semiconductor, wafer ID, chip ID, and manufacturing number or the like can be recognized.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile