Ryuma Iwashita

Title: The Innovative Contributions of Ryuma Iwashita

Introduction

Ryuma Iwashita is a notable inventor based in Gunma, Japan. He has made significant contributions to the field of lithography through his innovative patent. His work focuses on enhancing the precision and stability of multi-beam formation devices.

Latest Patents

Ryuma Iwashita holds a patent for a "Device, manufacturing method, and exposure apparatus." This invention aims to realize a multi-beam formation device that can stably machine fine patterns using complementary lithography. The device includes an aperture layer with a first aperture that deforms and passes a beam incident from the first surface side. Additionally, it features a deflection layer that passes and deflects the beam that has been processed by the aperture layer. The deflection layer comprises a first electrode section facing a beam passing space and a second electrode section that extends toward the beam passing space, sandwiching it between the first electrode and the end portion of the second electrode.

Career Highlights

Ryuma Iwashita is currently associated with Advantest Corporation, where he continues to push the boundaries of innovation in his field. His work has been instrumental in advancing technologies related to lithography and beam formation.

Collaborations

Throughout his career, Ryuma has collaborated with talented individuals such as Akio Yamada and Shinji Sugatani. These collaborations have contributed to the development of cutting-edge technologies in the industry.

Conclusion

Ryuma Iwashita's contributions to the field of lithography through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and inspire future innovations.