Kanagawa, Japan

Ryuji Tomita

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2006-2010

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2 patents (USPTO):Explore Patents

Title: Ryuji Tomita: Innovator in Semiconductor Technology

Introduction

Ryuji Tomita is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to manufacturing processes.

Latest Patents

One of Ryuji Tomita's latest patents is a method of manufacturing semiconductor devices. This method involves forming a metal film on a substrate and subjecting it to heat treatment. The process includes acquiring the relationship between substrate warping and the heat treatment temperature during silicide formation. A silicide film is created by forming a metal film on a substrate and heat treating it, which also involves measuring the substrate during the heat treatment. The relationship between substrate warping and heat treatment temperature is determined, and adjustments to the heat treatment conditions are made if the difference between found and measured warping exceeds a predetermined value.

Another notable patent is for a semiconductor device equipped with a guard ring designed to prevent water from entering the circuit region from the outside. This device features a first guard ring surrounding the circuit region, a second ring positioned between the circuit region and the first guard ring, and first connections linking the two guard rings. The area between the guard rings is divided into multiple subareas by the first connections, ensuring that even if the first guard ring is partially defective, water intrusion is limited to only the subarea adjacent to the defect.

Career Highlights

Ryuji Tomita is currently employed at NEC Electronics Corporation, where he continues to develop innovative solutions in semiconductor technology. His work has significantly impacted the efficiency and reliability of semiconductor devices.

Collaborations

Ryuji has collaborated with notable colleagues such as Tetsuya Kurokawa and Takashi Ishigami, contributing to advancements in their field through teamwork and shared expertise.

Conclusion

Ryuji Tomita's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as an influential inventor. His innovative methods and designs continue to shape the future of semiconductor manufacturing.

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