Hsinchu, Taiwan

Ryuji Nishikawa

This inventor holds 12 USPTO granted patents. Top assignees: Chimei Innolux Corporation, Innolux Corporation, Tpo Displays Corporation. Active years: 2011-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuji Nishikawa. Retrieved from https://idiyas.com/inventor/ryuji-nishikawa-ap7e6wrz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Hsinshu, TW (2012)
  • Chu-Nan, TW (2012 - 2014)
  • Hsinchu, TW (2011 - 2015)

Company Filing History:


Years Active: 2011-2015

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12 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Ryuji Nishikawa

Introduction: Ryuji Nishikawa is a pioneering inventor based in Hsinchu, Taiwan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ryuji Nishikawa holds several patents in the areas of semiconductor technology, nanotechnology, and renewable energy solutions, showcasing his commitment to pushing the boundaries of scientific advancement.

Career Highlights: With a career spanning over two decades, Nishikawa has worked with leading research institutions and technology companies, playing a key role in the development of cutting-edge products and solutions that have revolutionized the industry.

Collaborations: Throughout his career, Ryuji Nishikawa has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and knowledge sharing that has led to significant breakthroughs in various technological domains.

Conclusion: Ryuji Nishikawa's relentless pursuit of innovation and his passion for pushing the limits of what is possible have established him as a visionary inventor whose work continues to inspire and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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