This inventor holds 1 USPTO granted patent. Top assignee: Adv Antest Corporation. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Ryuichi Ogino: Inventor in Pattern Inspection Technology.
Introduction
Ryuichi Ogino is an inventor associated with Tokyo, Japan, and Advantest Corporation. His patent work concerns pattern inspection using scanning electron microscope (SEM) images.
Latest Patents
The provided information lists one patent for Ogino: “Pattern Inspection Apparatus and Method.” The invention measures distortion in an SEM image’s scanning direction and uses that distortion data to align the image with design data. It then places a measurement region based on the alignment and may assess how closely the patterns match.
Career Highlights
Ogino’s listed patent addresses image distortion and pattern matching, supporting more accurate inspection of patterns by relating SEM images to their design data. The supplied information identifies Advantest Corporation as his company.
Collaborations
The provided information names Soichi Shida and Yoshiaki Ogiso as Ogino’s coworkers.
Conclusion
Ryuichi Ogino’s listed invention focuses on improving pattern inspection by accounting for SEM image distortion and aligning inspection images with design data.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile