Ryuhei Miyashiro

Title: Ryuhei Miyashiro and Precision Exposure Technology

Introduction

Ryuhei Miyashiro is an inventor associated with Canon Kabushiki Kaisha in Tokyo, Japan. His listed patent concerns exposure technology used in device manufacturing. The available information identifies him as a man and lists 1 patent.

Latest Patents

Miyashiro’s listed patent is “Exposure Apparatus and Method, and Device Manufacturing Method.” It describes an apparatus that exposes a substrate to light while a movable stage holds and positions the substrate. A measuring device detects positional deviations of marks on the substrate, and a computing device calculates a linear expression to approximate those deviations.

The computing device uses an integer programming method to determine coefficients that minimize the number of marks whose approximation errors fall outside a specified allowable range. A control device then positions the substrate stage according to a target position derived from the expression, supporting accurate exposure of a shot.

Career Highlights

The patent reflects Miyashiro’s work on measurement, computational optimization, and stage control in exposure systems. These technologies are relevant to manufacturing processes that require precise positioning during the exposure of substrates.

Collaborations

Miyashiro is associated with Canon Kabushiki Kaisha. Youzou Fukagawa is listed as a coworker.

Conclusion

Ryuhei Miyashiro’s listed patent highlights an approach to improving substrate positioning in exposure apparatus through measured deviations and integer-programming-based optimization.