The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Apr. 25, 2007
Ryuhei Miyashiro, Tokyo, JP;
Youzou Fukagawa, Kawachi-gun, JP;
Ryuhei Miyashiro, Tokyo, JP;
Youzou Fukagawa, Kawachi-gun, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for exposing a substrate to light. A substrate stage holds the substrate and is to be moved. A measuring device measures a positional deviation amount of a mark on the substrate held by the substrate stage. A computing device determines a coefficient of a linear expression that approximates the measured positional deviation amount of each mark and is linear with respect to a term including at least one of an X coordinate to the Nth power and a Y coordinate to the Nth power, where N is an integer not less than zero, and a control device controls a position of the substrate stage in accordance with a target position determined based on the linear expression to expose a shot to the light. The computing device determines the coefficient in accordance with an integer programming method so as to minimize a number of marks, each of which satisfies a condition that a difference between the measured positional deviation amount and the approximated positional deviation amount is out of a predetermined allowable range.