This inventor holds 2 USPTO granted patents. Top assignee: Jsr Corporation. Active years: 2016-2017.
Company Filing History:
Years Active: 2016-2017
Title: Ryu Matsumoto: Innovator in Photoresist Technology
Introduction
Ryu Matsumoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of methods and compositions that enhance substrate processing.
Latest Patents
Matsumoto holds 2 patents that focus on resist pattern-forming methods and photoresist compositions. His latest patents include a resist pattern-forming method that involves providing a resist film using a specific photoresist composition, exposing the resist film, and developing the exposed resist film. The photoresist composition contains a polymer with a weight average molecular weight ranging from 1,000 to 7,500, which includes an acid-labile group that is dissociated by an acid's action. Additionally, it features a radiation-sensitive acid generator and a solvent composition, with a solid content between 20% and 60% by mass. The composition is designed to have a viscosity between 50 mPa·s and 150 mPa·s at 25°C.
Career Highlights
Matsumoto is currently employed at JSR Corporation, where he continues to innovate in the field of photoresist technology. His work has been instrumental in advancing the capabilities of substrate processing methods.
Collaborations
He collaborates with notable colleagues such as Yuichiro Katsura and Motoyuki Shima, contributing to a dynamic research environment that fosters innovation.
Conclusion
Ryu Matsumoto's contributions to photoresist technology and his innovative patents highlight his role as a key figure in the field. His work continues to influence advancements in substrate processing methods.